Thin Film Patterning
Process: Ablation
Fine Features on Thin Films
Micron-level precision, enabling fine features on thin films such as high-density circuits and thin-film solar cell scribing.
Non-Contact Process
Non-contact process eliminates tool wear and contamination risks.
Precision Laser Patterning for Thin Film
Laser technology offers several advantages in structuring thin films for applications such as solar cells, displays, sensors and advanced electronics. Unlike conventional lithography or mechanical processes, lasers deliver non-contact, maskless and highly selective patterning, ensuring minimal material waste and maximum design flexibility.
Waleed Hafez
Project lead
Why it matters?
This is a non-contact process, which means no tool wear, no contamination and far greater long-term system reliability. Supporting material versatility, MLAb performs across metals, dielectrics, semiconductors and transparent conductive oxides, so manufacturers aren’t locked into narrow process windows. It’s also designed for scale: compatible with roll-to-roll and large-area substrates, making high-volume manufacturing not just possible but more efficient. By removing the needs for chemicals, masks and multi-stage etching, it offers a cleaner, more sustainable manufacturing route. With micron-level precision, MLAb can consistently produce extremely fine, intricate features, ideal for advanced applications where detail and repeatability are critical.
Speak to our team today
We’d love to chat to you about our laser solutions and how we can work together.